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Plasma Nanoprocess Science Lab
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The lab takes on atomic-level etching and nanomaterials fabrication using plasma.
AboutAbout the lab
Processing at the atomic scale with low-temperature plasma
The Ishikawa Lab studies new technologies built on low-temperature plasma science.
Plasma, generated by creating a discharge in a gas, is used for deposition and etching of the semiconductors that are essential for smartphones and other devices.
By observing the behavior of ions and radicals in plasma and modeling surface reactions at the atomic level, the lab aims to control processing.
The lab also uses plasma technology to make new materials, such as carbon materials suited to battery electrodes.
Key terms
- Etching
- Processing that removes material from a surface through chemical reactions or similar means to form shapes such as trenches or holes for wiring
- Radical
- An atom or molecule in a highly reactive state. Radicals are generated in plasma and react with material surfaces
- Carbon nanowall
- A carbon material in which sheet-like graphite stands vertically on a substrate surface like walls
NewsLab news
A doctoral student wins the IPTJC2025 Oral Presentation Competition Award (1st place)
A student wins the VASSCAA-12 Special Award (Poster Award)
A student wins the IUVSTA-Elsevier Student Awards
Assistant Professor Inoe wins the ISPlasma2024 Best Oral Presentation Award
ResearchResearch themes
The lab studies innovative technologies that make use of low-temperature plasma science. Centered on plasma etching and the creation of nanomaterials with plasma, the lab measures and analyzes phenomena brought about by plasma and advances modeling.
*Illustrative imageAutonomous Nano-Plasma Equipment
The lab is developing equipment that measures, in real time, the temperature of the material being processed and the radical density in the plasma, and uses them for feedback control. The lab has made it possible to autonomously control the etched profile from temperature and radical density.
*Illustrative imageAtomic-Layer-by-Layer Etching
The lab aims to create an "atomic layer etching process" that etches at the level of single atomic layers while keeping crystal damage in silicon and other materials to a minimum. Selectivity between materials and control of the processed shape are the key challenges.
*Illustrative imageNanomaterials Made with Plasma
By varying the amounts of hydrogen atoms and hydrocarbon radicals in the plasma, the lab produces carbon materials ranging from diamond to graphite. It also studies carbon nanowalls, in which sheets of graphite stand vertically, and graphene synthesized with plasma in alcohol.
MembersFaculty
The Ishikawa Lab's members consist of faculty, doctoral, master's, and undergraduate students, research students, researchers, URAs, administrative staff, and technical staff.
- ProfessorKenji Ishikawa
- ProfessorNo Van Non
- Project ProfessorShinan Xiao
- Associate ProfessorTakayoshi Tsutsumi
- Project Associate ProfessorCamelia MIRON
- Project Associate ProfessorNguyen Thi Thuy Nga
- Project Associate ProfessorNikolay BRITUN
- Project LecturerZhiyu Ma
- Project LecturerHiroshi Hashizume
- Assistant ProfessorKenichi Inoe
- Project Assistant ProfessorZheya Wu
- Project Assistant ProfessorAirah Peraro OSONIO
- Project Assistant ProfessorTrung Nguyen TRAN
- Project Assistant ProfessorKazuya Ishikawa
- Project Assistant ProfessorFrancis Amalraj SUSAI
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Report an errorAbout the images
The top and research theme images are illustrative and were not taken at the lab. They are cropped from Wikimedia Commons images. Cropped CC BY-SA images are provided under the same CC BY-SA license as the original (version shown on each line).
- Top image: “Plasma Pencil” Entropi5 / CC BY-SA 3.0 (cropped)
- Autonomous Nano-Plasma Equipment: “Horne Hybrid Reactor Prototype” Ron3000001 / CC BY-SA 4.0 (cropped)
- Atomic-Layer-by-Layer Etching: “Silicon wafer researcher” U.S. Department of Energy / Public domain (cropped)
- Nanomaterials Made with Plasma: “Carbon Nanomaterials” Lengmartin / CC BY-SA 3.0 (cropped)
- Related lab (Nanobiosensing Lab): “Atomic force microscope by Zureks” Zureks / CC BY-SA 3.0 (cropped)
- Related lab (Life Electronics Lab): “Plasma-filaments” The original uploader was Iantresman at English Wikipedia. / CC BY 2.5 (cropped)
- Related lab (Functional Integrated Devices Lab): “Wafer - 4” Windell Oskay / CC BY 2.0 (cropped)
- Related lab (Plasma Electronics Lab): “Bell Jar 35 with Argon Plasma” Diener electronic GmbH + Co KG / CC BY-SA 4.0 (cropped)
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