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Functional Integrated Devices Lab
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A lab that creates a new generation of semiconductor devices using silicon nanostructures.
AboutAbout the lab
Taking on the development of next-generation nanoelectronic devices!
Makihara Lab researches the semiconductor technologies that underpin the advancement of electronics.
The lab's research spans everything from materials science to the processes used to fabricate devices.
The lab works on incorporating nanostructures such as silicon-based quantum dots into devices, improving transistor performance, and developing devices that combine light and electronics as well as new types of memory.
Through joint research with overseas research institutions and presentations at academic conferences, students can develop the abilities expected of independent engineers and researchers.
Key terms
- Quantum dot
- An extremely small semiconductor particle, nanometers in size. It confines electrons inside and shows properties different from those of a large crystal.
- MOS transistor
- A transistor with a structure of stacked metal, oxide film, and semiconductor. It is a basic component used to make computer chips.
- Gate insulating film
- In a transistor, a thin insulating film between the semiconductor and the electrode (the gate) that switches the current on and off.
NewsLab news
A master's student received the Outstanding Presentation Award at AWAD2026
Makihara Lab was launched
Recruiting students for the graduate school (Graduate School of Engineering, Department of Electronics)
ResearchResearch themes
To contribute to advancing semiconductor technology, especially silicon nanotechnology, the lab conducts cross-cutting research ranging from materials science to process integration and device fabrication technology. Alongside improving the performance of silicon-based thin-film transistors and fine-scale MOS transistors, it focuses on developing devices that integrate photonics and electronics, as well as memory with new functions.
*Illustrative imageDevices Incorporating Nanostructures
The lab integrates silicon-based nanostructures into MOS devices to advance the functions of the devices themselves. It also works on applications to intelligent information processing devices that operate with a small number of electrons or photons.
*Illustrative imageMaterials and Processes for Integrated Devices
Using high-resolution spectroscopic analysis and probe microscopy, the lab advances the materials science of high-k gate insulating films and gate-all-around (GAA) transistors. It also develops process technologies for fabricating such functional thin films with control at the level of individual atomic layers.
*Illustrative imageInterface Control and Thin-Film Devices
Aiming for devices that adopt new operating principles, new materials, and new processes, the lab focuses on two-dimensional crystals of group IV semiconductors. It improves techniques for observing the film growth process in situ and controlling it precisely, as well as techniques for fabricating devices.
MembersFaculty
Makihara Lab consists of faculty members, doctoral, master's, and undergraduate students, research students, and secretaries.As of 2026
- ProfessorKatsunori Makihara
- Assistant ProfessorTomoki Imai
VoicesStudent voices
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Report an errorAbout the images
The top and research theme images are illustrative and were not taken at the lab. They are cropped from Wikimedia Commons images. Cropped CC BY-SA images are provided under the same CC BY-SA license as the original (version shown on each line).
- Top image: “Wafer - 4” Windell Oskay / CC BY 2.0 (cropped)
- Devices Incorporating Nanostructures: “Lab Mol Colloidal quantum dots 02” Lab mol (Ilia Litvinov) / CC BY 4.0 (cropped)
- Materials and Processes for Integrated Devices: “Filling with hazardous reagents for the atomic layer growth process” R Ashurov / CC BY 4.0 (cropped)
- Interface Control and Thin-Film Devices: “RIAN archive 804046 Production of FemtoScan scanning probe microscopes (SPM) at Advanced Technologies Center” Ruslan Krivobok / Руслан Кривобок / CC BY-SA 3.0 (cropped)
- Related lab (Nano Electronic Properties Lab): “Old Type Electron Microscope” Ajay Kumar Chaurasiya / CC BY-SA 4.0 (cropped)
- Related lab (Energy Control Engineering (S) Lab): “Silicon heterojunction solar cell” Radiotrefoil / CC BY-SA 4.0 (cropped)
- Related lab (Plasma Nanoprocess Science Lab): “Plasma Pencil” Entropi5 / CC BY-SA 3.0 (cropped)
- Related lab (Power Electronics (S) Lab): “Electric insulators on top of a transformer (2)” High Contrast / CC BY 3.0 de (cropped)
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