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Ultraprecision Machining Lab
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A lab that develops ultraprecision machining methods to create surfaces with atomic-scale accuracy.
AboutAbout the lab
Supporting scientific progress through atomic-scale surface creation
The Ultraprecision Machining Lab (Sano Lab) studies machining methods that create surfaces with atomic-scale accuracy, and X-ray instruments that use them.
Using reactive species in plasma and reactive nanoparticles in solution, the lab has established techniques that shape surfaces to within 0.5 nanometers of error and finish the surfaces of X-ray mirrors and semiconductor substrates.
In joint research with the Optics Group at SPring-8 (RIKEN), the lab is developing an ultra-high-resolution scanning X-ray microscope and X-ray micro-CT.
The lab has also begun applied research on its newly developed X-ray instruments in collaboration with fields such as medicine, biology, and pharmaceutical science.
Key terms
- SPring-8
- A large synchrotron radiation facility. The lab uses its X-rays to run evaluation experiments on the mirrors and microscopes it has made.
- X-ray mirror
- A mirror for focusing X-rays. The lab makes them using ultraprecision machining technology.
- Scanning X-ray microscope
- A microscope that directs a finely focused X-ray beam onto a sample, moves it across the sample, and builds an image from the signal at each position.
NewsLab news
A master's student won the Best Presentation Award at the Kansai Regional Regular Academic Lecture Meeting
Research on single-shot imaging with 10 nm resolution using an XFEL was featured in a press release
Research on high-precision XFEL pulse duration measurement using X-ray crystal optics was featured in a press release
A master's student won the Best Presentation Award at the Academic Lecture of the Autumn Meeting of the Japan Society for Precision Engineering
ResearchResearch themes
The lab explores physical and chemical phenomena that can be used to create surfaces, and develops atomic-scale surface creation methods by controlling them precisely at the atomic and molecular level. It also develops methods for examining the structure and properties of the processed surfaces, and is extending applications to X-ray optical elements, semiconductor device processes, and collaboration with fields such as medicine and biology.
*Illustrative imageAtomic-scale surface creation methods
The lab searches for phenomena that can be used to create surfaces and develops them into new surface processes. Through simulations and experiments in an ultraclean room, it studies these phenomena in detail, aiming to establish precise control techniques.
*Illustrative imageSub-nanometer structural control over large areas
The lab develops techniques to form arbitrary shapes with sub-nanometer accuracy on surfaces ranging from 10 mm to 1000 mm in scale. By precisely controlling phenomena that occur at the atomic scale, it aims at concrete manufacturing applications.
*Illustrative imageDevelopment of semiconductor device processes
Using techniques for controlling nanoscale structures over large areas, the lab researches and develops methods for forming next-generation ultrathin SOI and manufacturing processes for semiconductor devices.
*Illustrative imageDevelopment of X-ray optical elements and optical systems
The lab fabricates X-ray optical elements using its technique for controlling large-area structures with sub-nanometer accuracy, and builds X-ray optical systems. In joint research with the Optics Group at SPring-8 (RIKEN), it is developing an ultra-high-resolution scanning X-ray microscope and X-ray micro-CT.
MembersFaculty
The members of the Ultraprecision Machining Lab (Sano Lab) consist of faculty, visiting professors and visiting faculty, visiting researchers, doctoral, master's, and undergraduate students, and secretaries.As of 2026
- ProfessorYasuhisa Sano
- Associate ProfessorJumpei Yamada
- Assistant ProfessorDaisetsu Toh
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Report an errorAbout the images
The top and research theme images are illustrative and were not taken at the lab. They are cropped from Wikimedia Commons images. Cropped CC BY-SA images are provided under the same CC BY-SA license as the original (version shown on each line).
- Top image: “Optician Polishing Large CXO Mirror Shell At HDOS (illustrations-mirrorFab-Optician Polishing Large CXO Mirror Shell At HDOS - 1-300)” NASA/SAO / Public domain (cropped)
- Atomic-scale surface creation methods: “Stone Flower (Кам’яна квітка)” Яна Сычикова, Сергей Ковачев / CC BY-SA 4.0 (cropped)
- Sub-nanometer structural control over large areas: “Polishing a 4-Meter Mirror (PolishingandGrindingthe4-mTelescopeVI-CC)” NOIRLab/AURA/NSF / CC BY 4.0 (cropped)
- Development of semiconductor device processes: “Semiconductor clean room” Aileen Devlin/Jefferson Lab from Newport News, USA / Public domain (cropped)
- Development of X-ray optical elements and optical systems: “XRISM s X-ray mirror assembly” NASA / Public domain (cropped)
- Related lab (Nanomanufacturing Science Lab): “Plasma Rapid Oxidation Technique for Extending Component Tenabil (KSC-20221102-PH-KLS01 0018)” Kim Shiflett / Public domain (cropped)
- Related lab (Nano Surface and Interface Engineering Lab): “Scanning tunneling microscope-MHS 2237-IMG 3817-white” Rama / CC BY-SA 3.0 fr (cropped)
- Related lab (Nanoelectronics Lab): “Metamaterial” Nalaf / CC BY-SA 4.0 (cropped)
- Related lab (Physical Organic Chemistry Lab): “Sumanene-3D-balls” Jynto (talk) / CC0 (cropped)
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