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Nano Surface and Interface Engineering Lab
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The lab explores semiconductor surfaces at the atomic and molecular level.

AboutAbout the lab
Leading and pioneering surface science-based manufacturing
The Nano Surface and Interface Engineering Lab (Arima Lab) studies how to understand and control, at the atomic and molecular level, interactions at solid–liquid and solid–gas interfaces.
Using microscopes that can image the arrangement of atoms, spectroscopic analysis that probes the very thin outermost layers of a surface, and simulations based on quantum mechanics, the lab works on ultra-precision surface measurement.
The lab is also creating high-performance semiconductor nanomaterials by making use of novel etching phenomena, and developing new surface processes.
Established in April 2023, it is a relatively new lab, and aims to contribute to the future of manufacturing, including the creation of next-generation green devices.
Key terms
- Etching
- A processing method that uses chemicals, plasma, or similar means to remove material from a surface and form shapes or structures
- Graphene
- A sheet-like material consisting of a single layer of carbon atoms, one atom thick
- Silicon carbide
- A compound of silicon and carbon, also written as SiC
NewsLab news
A master's student received the Best Poster Presentation Award at the Kansai Regional Regular Academic Meeting of the Japan Society for Precision Engineering
A master's student received a Presentation Encouragement Award from the Japan Society of Applied Physics
A student received the Excellent Presentation Award at the Japan Society for Precision Engineering's graduation research presentation meeting for student members
A master's student received the Osaka University Engineering Society Award
A master's student received the Young Scientist Award at PCSI-51
ResearchResearch themes
The lab aims to advance production technology by understanding and controlling solid surfaces and interfaces at the atomic and molecular level. Combining experiments with simulations based on quantum mechanics, it works on creating high-performance semiconductor nanomaterials and developing new surface processes.
*Illustrative imageCreating Si atomic-layer ribbons
Materials whose dimensions shrink to the nanometer scale show properties not seen in bulk. The lab is developing a new method that uses multiple solid–liquid interface processes to make Si atomic-layer ribbons with controlled width and thickness.
*Illustrative imageAtomic-scale evaluation of surface creation processes
Semiconductor surfaces precisely finished in an ultra-clean environment are visualized with a microscope that has atomic-level resolution. The performance of practical processes such as ultra-precision machining, wet cleaning, and film formation can be evaluated at the atomic scale.
*Illustrative imageNanocarbon and its etching function
The lab has worked on forming atomic-layer-thick graphene with few pit defects by combining plasma treatment with ultra-flat polished silicon carbide surfaces. Recently, it has been working on surface creation processes that make use of the corrosive action of nanocarbon.
*Illustrative imageDeep trench and hole fabrication without mechanical action
The lab focuses on methods that use the catalytic action of noble metals to create deep trenches and holes in semiconductor surfaces in solution. Using a different element embedded at the bottom of a trench or hole as a marker in the vertical direction, it evaluates the surface structure at the bottom of three-dimensional nanostructures.
MembersFaculty
The lab's members consist of faculty, doctoral, master's, and undergraduate students, technical assistants, and secretaries.As of 2026
- ProfessorKenta Arima
- Assistant ProfessorKoji Inagaki
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Report an errorAbout the images
The top and research theme images are illustrative and were not taken at the lab. They are cropped from Wikimedia Commons images. Cropped CC BY-SA images are provided under the same CC BY-SA license as the original (version shown on each line).
- Top image: “Scanning tunneling microscope-MHS 2237-IMG 3817-white” Rama / CC BY-SA 3.0 fr (cropped)
- Creating Si atomic-layer ribbons: “Scanning tunneling microscope (STM) 250 nm by 250 nm image of one-atom-thick silver islands grown on palladium (111) surface” Ponor / CC BY-SA 4.0 (cropped)
- Atomic-scale evaluation of surface creation processes: “Scanning tunneling microscope-MHS 2237-IMG 3817-gradient” Rama / CC BY-SA 3.0 fr (cropped)
- Nanocarbon and its etching function: “Graphen” AlexanderAlUS / CC BY-SA 3.0 (cropped)
- Deep trench and hole fabrication without mechanical action: “Dry etching test strucutres” Mgerlt / CC BY 4.0 (cropped)
- Related lab (Atomic Process Control Lab): “Scanning tunneling microscope-MHS 2237-IMG 3816” Rama / CC BY-SA 3.0 fr (cropped)
- Related lab (Ultraprecision Machining Lab): “Optician Polishing Large CXO Mirror Shell At HDOS (illustrations-mirrorFab-Optician Polishing Large CXO Mirror Shell At HDOS - 1-300)” NASA/SAO / Public domain (cropped)
- Related lab (Applied Electrochemistry Lab): “Samsung E1200i - Lithium-ion battery AB463446BU-4035” Raimond Spekking / CC BY-SA 4.0 (cropped)
- Related lab (Computational Physics Lab): “Xanthoconite crystal structure (Engel-Nowacki 1968) polyhedra model free axis” Ra'ike (Wikipedia) / CC0 (cropped)
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