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Semiconductor Process Science Lab
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The lab studies semiconductor manufacturing processes by measuring plasmas.

AboutAbout the lab
Measuring plasma to make semiconductor fabrication a science
The lab is one of the divisions of the Center for Low-temperature Plasma Sciences, and it studies how to scientifically understand the plasma processes used to make semiconductor devices.
Using the center's plasma gas-phase and surface diagnostic technologies, the lab measures the density, energy, and spatiotemporal distribution of reactive atoms and molecules during processing.
Building on this understanding, the lab aims to create innovative plasma manufacturing processes for next-generation semiconductor device integration.
Key terms
- Plasma gas-phase and surface diagnostics
- Techniques for measuring and examining the state of the gas in a plasma and the state of the surface being processed
- Spatiotemporal distribution
- A description of how a quantity changes and spreads over time and from place to place
ResearchResearch themes
The lab aims to understand, through measurement, the manufacturing processes of semiconductor devices that use plasma. On that basis, its goal is to create new plasma manufacturing processes for next-generation semiconductor devices.
View More ↗MembersFaculty
The lab's members consist of Professors, Project Professors, Project Associate Professors, Project Lecturers, and Project Assistant Professors.As of 2026
- ProfessorKenji Ishikawa
- Project ProfessorKazuhiro Karahashi
- Project Associate ProfessorNGUYEN Thi-Thuy-Nga
- Project LecturerChih-Yu Ma
- Project Assistant ProfessorOSONIO Airah Peraro
VoicesStudent voices
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Report an errorAbout the images
The top and research theme images are illustrative and were not taken at the lab. They are cropped from Wikimedia Commons images. Cropped CC BY-SA images are provided under the same CC BY-SA license as the original (version shown on each line).
- Top image: “Plasma globe with looped filament” Xyqorophibian / CC BY-SA 4.0 (cropped)
- Measuring and Creating Plasma Processes for Semiconductor Manufacturing: “Clean room” Uploaded by Duk 08:45, 16 Feb 2005 (UTC) / Public domain (cropped)
- Related lab (グリーンDXプラズマ部門
(Ngo Van Nong) ): “Coils of the "Ministellarator" experiment at IPP Greifswald” Siarhei V / CC BY-SA 4.0 (cropped) - Related lab (プラズマ科学部門
(堤 隆嘉) ): “Pegasus Toroidal Experiment ( )” troop_156_glenview / CC0 (cropped) - Related lab (プラズマバイオ部門): “Laboratory of Dust Plasma Diagnostics” Stanislav Liubauskas / CC BY 4.0 (cropped)
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