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無機材料×深紫外レーザープロセス研究室
Showing the original Japanese · View translation
紫外線レーザーで半導体デバイスと酸化物材料を研究する研究室。
AboutAbout the lab
紫外線レーザーで新しい半導体の製造法を探る。
無機材料×深紫外レーザープロセス研究室は、
エキシマレーザーと
酸化物半導体や
研究室の
Key terms
- エキシマレーザー
- 強力な
紫外線の パルス光を 発生させる 装置。 この 研究室では 半導体材料の 特性を 変える 処理や 薄膜づくりに 使う - 酸化物半導体
- 酸化物を
材料に した 半導体。 低温の プロセスでも 優れた 半導体 特性を 示すIGZOなどが ある - 誘電体
- 半導体デバイスで
ゲート絶縁膜や 容量膜に 使われる 材料
NewsLab news
View More ↗ResearchResearch themes
この
*Illustrative image深紫外レーザーによる製造プロセス
エキシマレーザーの
酸化物半導体・誘電体材料の研究
低温プロセスで
MembersFaculty
無機材料×深紫外レーザープロセス研究室の
- Professor薮田 久人
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マイクロ・ナノレーザーデバイス研究室工学部 電気情報工学科マイクロ・ナノレーザーデバイスグループでは、
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集積磁気デバイス研究室工学部 電気情報工学科我々のThe information on this page is compiled by the LabLog team from the lab's public information and interviews. For corrections or removal requests, please contact LabLog, not the lab.
Report an errorAbout the images
The top and research theme images are illustrative and were not taken at the lab. They are cropped from Wikimedia Commons images. Cropped CC BY-SA images are provided under the same CC BY-SA license as the original (version shown on each line).
- Top image: “Metal Oxide TFT Cross Section” NoAppliedVoltage / CC BY-SA 4.0 (cropped)
- 深紫外レーザーに
よる 製造プロセス: “Excimer laser 1” IoOALP / CC BY-SA 4.0 (cropped) - Related lab (マイクロ・ナノレーザーデバイス研究室): “Lasers” 彭嘉傑 / CC BY 2.5 (cropped)
- Related lab (機能発現集積システム研究室): “SJ3159 die” Mister rf / CC BY-SA 4.0 (cropped)
- Related lab (原子層プロセス科学研究室): “Filling with hazardous reagents for the atomic layer growth process” R Ashurov / CC BY 4.0 (cropped)
- Related lab (集積磁気デバイス研究室): “2019 Rozebrane dyski twarde” Jacek Halicki / CC BY-SA 4.0 (cropped)
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