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Atomic Layer Process Science Lab
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A lab exploring thin-film and surface reactions at the atomic layer and the degradation of devices.
AboutAbout the lab
The science of atomic-layer reactions and degradation
The Atomic Layer Process Science Lab studies thin-film and surface reactions, and the mechanisms by which devices degrade, in semiconductor transistors that have shrunk to a few nanometers.
According to the lab's website, a smartphone contains as many as 20 billion transistors with a design scale of a few nanometers.
Aiming at the electronics of a future in which miniaturization and high integration advance further and fuse with quantum computers, the lab works on the science of thin-film and surface reactions at the atomic-layer scale.
On the lab's website, it is presented under the name "Kondo Lab."
Key terms
- Transistor
- A basic component of electronic circuits made from semiconductors. Smartphones contain large numbers of them
- Reactive species
- Particles that exist in many varieties in plasma and trigger the reactions that form thin films at low temperatures
- Scanning probe microscope
- A type of microscope used to observe surfaces at the atomic level
ResearchResearch themes
The lab studies the science of thin-film and surface reactions at the atomic-layer scale, aimed at the electronics of a future in which miniaturization and high integration advance and fuse with quantum computers. It also studies the dynamics of nanodevice degradation.
*Illustrative imageRadical-Activated Atomic Layer Process Science
Plasma-radical processes, which can deposit films at low temperatures through reactions of reactive species, involve complex reactions that are difficult to control and understand. The lab quantitatively decodes this reaction environment through real-time measurement of reactive species and surface reactions, combined with analysis using informatics such as machine learning.
*Illustrative imageVisualizing Degradation at the Atomic Layer
In nanoscale semiconductor devices, high-density currents and electric fields cause degradation at the atomic-layer level, which leads to malfunction. The lab observes degradation under plasma irradiation and during device operation in real time at the atomic level, using scanning probe microscopy and transmission electron microscopy, to clarify the mechanisms.
MembersFaculty
- ProfessorHiroki Kondo
VoicesStudent voices
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Report an errorAbout the images
The top and research theme images are illustrative and were not taken at the lab. They are cropped from Wikimedia Commons images. Cropped CC BY-SA images are provided under the same CC BY-SA license as the original (version shown on each line).
- Top image: “Filling with hazardous reagents for the atomic layer growth process” R Ashurov / CC BY 4.0 (cropped)
- Radical-Activated Atomic Layer Process Science: “Aomic-layer-deposition-system” Center for Integrated Nanotechnologies - Los Alamos National Laboratory / Public domain (cropped)
- Visualizing Degradation at the Atomic Layer: “Three monolayer concepts relevant to atomic layer deposition” Riikka Puurunen / CC BY 4.0 (cropped)
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