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Quantum Beam Materials Science Lab [Institute of Scientific and Industrial Research]
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The lab investigates the chemical reactions that quantum beams cause in materials.
AboutAbout the lab
Uncovering the chemical reactions between quantum beams and materials.
The Quantum Beam Materials Science Lab (Kozawa Lab) studies the chemical reactions that quantum beams, such as electron beams, extreme ultraviolet light, and X-rays, cause in materials, as well as the reaction fields in which they occur.
The lab aims to clarify the whole chemical reaction system, from the energy deposited by a quantum beam, through the chemical reactions, to the emergence of a function.
Based on this knowledge, the lab is building new chemical reaction systems that make it possible to manufacture next-generation high-performance semiconductors.
The lab also studies photosensitive materials (resists) used in the microfabrication of semiconductors.
Key terms
- Quantum beam
- A general term for electron beams, extreme ultraviolet light, lasers, synchrotron radiation, X-rays, gamma rays, ion beams, and similar beams. They are directed at materials to trigger chemical reactions
- Lithography
- An ultrafine microfabrication technology that underpins the semiconductor industry
- Resist
- A photosensitive material used in the lithography process. Its performance determines the precision of semiconductor circuits
- Supercritical state
- A state that water enters at a temperature of 374°C or higher and a pressure of 22.1 MPa or higher. Its density changes greatly with pressure
ResearchResearch themes
Quantum beams in the ionizing radiation range have short wavelengths, so they can deposit energy in a finer region than light can and trigger chemical reactions there. The lab investigates the reactions that quantum beams cause in materials, from the design of materials used in semiconductor manufacturing to radiation-induced chemical reactions under extreme conditions and in nanoparticles.
*Illustrative imageNanochemistry for Mass Production of Semiconductors
In lithography that uses extreme ultraviolet (EUV) light as the exposure source, image formation shifts from using the excited states of photosensitive molecules to using ionization of the material and secondary electrons. This requires a fundamental change in material design.
*Illustrative imageExtreme Ultraviolet Photochemistry in the Condensed Phase
Radiation chemistry in the extreme ultraviolet range is largely unexplored, and it offers extreme spatial and temporal resolution. This energy range is important for clarifying the spatial distribution of cation-electron ion pairs produced by the interaction between quantum beams and molecules, and the details of the chemical reactions that follow.
*Illustrative imageBeam-Induced Reactions Under Extreme Conditions
The lab studies the interaction between radiation and materials under extreme conditions such as high temperature and high pressure or the supercritical state. Temperature, pressure, and density can be varied widely, so the lab pursues the essence of radiation-induced chemical reactions that cannot be distinguished at room temperature.
*Illustrative imageRadiation Chemistry of Nanoparticles and Colloids
Nanoparticles and colloids are attracting attention as functional materials with new catalytic activity and high durability. The lab is clarifying how quantum beams induce the formation of nanoparticles and the interfacial reactions that follow, with the aim of finding and controlling new reaction pathways.
MembersFaculty
The members of the Kozawa Lab consist of faculty, project faculty, project researchers, doctoral and master's students, research assistants, and project administrative staff.As of 2026
- ProfessorTakahiro Kozawa
- Associate ProfessorYusa Muroya
- Assistant ProfessorKazumasa Okamoto
- Assistant ProfessorYuqing Jin
- Project ProfessorToshiro Itani
- Project Associate ProfessorJulius Joseph Sudlay Santillan
- Project Associate ProfessorEiichi Nomura
- Project Assistant ProfessorYuko Ito
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Report an errorAbout the images
The top and research theme images are illustrative and were not taken at the lab. They are cropped from Wikimedia Commons images. Cropped CC BY-SA images are provided under the same CC BY-SA license as the original (version shown on each line).
- Top image: “Lithographie EUV” JB Waldner / CC BY-SA 3.0 (cropped)
- Nanochemistry for Mass Production of Semiconductors: “A semiconductor wafer being removed from processing equipment” YouTube — Purdue Engineering / CC BY 4.0 (cropped)
- Extreme Ultraviolet Photochemistry in the Condensed Phase: “Skylab Extreme Ultraviolet (XUV) Spectrograph (7016160)” NASA/MSFC / Public domain (cropped)
- Beam-Induced Reactions Under Extreme Conditions: “Supercritical Fluids Reactor” RHanush / CC BY-SA 4.0 (cropped)
- Radiation Chemistry of Nanoparticles and Colloids: “Gold nanoparticles as indicators” Valeg96 / CC BY-SA 4.0 (cropped)
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