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遠藤・大堀 研究室
Showing the original Japanese · View translation
半導体のナノデバイスで、情報とエネルギーの流れを制御する研究室。
AboutAbout the lab
半導体技術で、情報とエネルギーの流れを制御する。
遠藤研究室は、
微細な
実際に
産業技術総合研究所や、
Key terms
- ナノデバイス
- 大きさが
ナノメートル （100万分の 1ミリ）の 単位で つくられた、 半導体の 素子 - 2次元材料
- 原子1〜数層ぶんの
厚さしかない、 シートのような 材料
ResearchResearch themes
半導体ナノデバイスを
*Illustrative image原子層レベルのプロセス
原子層エッチングや
*Illustrative image新材料でつくるデバイス
移動度の
MembersFaculty
遠藤研究室の
- Professor遠藤 和彦
VoicesStudent voices
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Report an errorAbout the images
The top and research theme images are illustrative and were not taken at the lab. They are cropped from Wikimedia Commons images. Cropped CC BY-SA images are provided under the same CC BY-SA license as the original (version shown on each line).
- Top image: “IMaGe 31072R – Silicon Wafer 20120926” Rob Bulmahn / CC BY 2.0 (cropped)
- 原子層レベルの
プロセス: “Filling with hazardous reagents for the atomic layer growth process” R Ashurov / CC BY 4.0 (cropped) - 新材料で
つくる デバイス: “CW-01 National Semiconductor Scientific Calculator Watch CMOS-LSI circuit dies” Mister rf / CC BY-SA 4.0 (cropped) - Related lab (石本・
大島 研究室): “Dutch national supercomputer "Huygens"” Dennis van Zuijlekom / CC BY-SA 2.0 (cropped) - Related lab (高橋(英)・横山(俊)・横山(幸) 研究室): “Lab glassware” Tweenk / CC BY 3.0 (cropped)
- Related lab (徳増 研究室): “Wikimedia Foundation Servers-8055 13” Victorgrigas / CC BY-SA 3.0 (cropped)
- Related lab (佐藤(岳)・LIU 研究室): “Beloplotov (Discharge in SF6 100Torr Plus) DSC06680” Dmitry Beloplotov / CC BY-SA 4.0 (cropped)
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