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Plasma Engineering Lab
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The lab uses plasma to create and control thin films and nanoparticles.
AboutAbout the lab
Controlling thin films and fine particles with the power of plasma
The Plasma Engineering Lab focuses on plasma processes, a key technology in the solar cell industry, as well as dusty plasmas and their applications, and plasma anisotropic CVD.
The lab works on developing thin films for solar cells, next-generation solar cell materials using nanoparticles, and insulating films for LSIs.
It also studies the mechanisms by which fine particles (dust) form and grow inside experimental fusion reactors, and the use of plasma to promote plant growth.
Key terms
- Plasma process
- A dry process that uses plasma to make thin films with few impurities. It is used in semiconductor devices and solar power generation.
- Plasma anisotropic CVD
- A method used in plasma-based thin film deposition (CVD) to control how films are deposited onto fine structures.
- Plasma agriculture
- Research that uses the chemically active molecules produced in plasma to promote plant growth, with the aim of applying it to agriculture.
NewsLab news
A master's student won the Student Presentation Encouragement Award at the Academic Meeting of the Kyushu Branch of the Japan Society of Vacuum and Surface Science
A master's student won the Presentation Encouragement Award at the Kyushu-Okinawa-Yamaguchi Branch Meeting of the Japan Society of Plasma Science and Nuclear Fusion Research
ResearchResearch themes
Aiming to create innovative plasmas, this lab studies plasma-based thin film fabrication, nanoparticle control, and plant growth promotion. Its main research topics are developing high-quality, high-throughput process technologies by controlling reactions in plasma, fabricating and applying functional nanoscale building blocks using plasma, clarifying the interaction between plasma and surfaces, and establishing plasma agriculture.
*Illustrative imageFabricating high-quality semiconductor and carbon thin films
The lab conducts basic research on plasma processes that can produce thin films with few impurities, and develops manufacturing technologies. Related work includes plasma-based measurement techniques and the creation of nanostructured devices using nanoparticles generated in plasma.
*Illustrative imageBiological applications of plasma to plants
Using the chemically active molecules produced in plasma, the lab is investigating how plant growth is promoted and how this can be applied to agriculture. It has found that exposing seeds to plasma for a short time promotes growth.
MembersFaculty
The lab's members consist of faculty, technical staff, technicians, part-time researchers, administrative assistants, doctoral, master's, and undergraduate students (including working-adult students), and cooperating faculty and staff.As of 2024
- ProfessorMasaharu Shiratani
- ProfessorKazunori Koga
- Associate ProfessorKunihiro Kamataki
- Project Associate ProfessorAttri Pankaj
- Associate ProfessorTakamasa Okumura
VoicesStudent voices
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Report an errorAbout the images
The top and research theme images are illustrative and were not taken at the lab. They are cropped from Wikimedia Commons images. Cropped CC BY-SA images are provided under the same CC BY-SA license as the original (version shown on each line).
- Top image: “FreshFrozenPlasma” DiverDave / CC BY-SA 3.0 (cropped)
- Fabricating high-quality semiconductor and carbon thin films: “Tetrahedral amorphous carbon thin film” Daniel Schwen / CC BY-SA 3.0 (cropped)
- Biological applications of plasma to plants: “Plasma Arc plant” Krystianh / Public domain (cropped)
- Related lab (Atomic Layer Process Science Lab): “Filaments inside a plasma tube” Bravemimoza / CC BY 4.0 (cropped)
- Related lab (Kansei Nano-Biosensor Lab): “Coffee Cupping-2” Visitor7 / CC BY-SA 3.0 (cropped)
- Related lab (Integrated Magnetic Devices Lab): “MTJ with Waveguide Electrodes & Contacting GSG Probe for Testing” OJB Quantum / CC BY 4.0 (cropped)
- Related lab (Spintronics Device Lab): “IZOT 0004С Disk Pack Side View” Mister rf / CC BY-SA 4.0 (cropped)
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