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Process Design Engineering Lab
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A lab that uses computation and AI to design how to make new semiconductor materials.
AboutAbout the lab
Materials development through computation and data science
The Process Design Engineering Lab researches and develops functional materials that contribute to energy saving and the SDGs.
Until now, developing new materials has meant searching for conditions such as deposition temperature and source material composition by trial and error, which takes a lot of time and effort.
The lab is pioneering "process informatics," which analyzes data obtained from experiments, measurements, and computational science using data science (AI) to reduce the number of trials.
Its targets are next-generation semiconductors such as nitride semiconductors, and it is developing a simulation technology (eXS2-CVD) that reproduces the entire chemical vapor deposition process in a virtual space.
The lab is looking ahead to high-efficiency power conversion devices, deep-ultraviolet lasers, and ultra-high-frequency devices for post-5G/6G communications.
Key terms
- Process informatics
- An approach that uses AI to analyze data on the conditions for making a material and efficiently find good conditions.
- Chemical vapor deposition
- A method in which source gas is supplied to a heated substrate and a thin film is deposited through reactions in the gas phase and on the surface.
- Nitride semiconductors
- Semiconductors that combine nitrogen with metals. They are expected to be used in high-efficiency power conversion and deep-ultraviolet light sources.
NewsLab news
A student received the Kyushu Branch President's Award from the Institute of Electrical Engineers of Japan
A student received the Student Poster Award at the 54th Japan Conference on Crystal Growth
A student received the Young Researcher Paper Presentation Award at the IEEJ Technical Meeting on Next-Generation Industrial Systems
A student received the Presentation Encouragement Award at the 53rd Japan Conference on Crystal Growth
A student received the Student Poster Award at the 53rd Japan Conference on Crystal Growth
ResearchResearch themes
The lab researches and develops next-generation wide-bandgap semiconductors as functional materials that contribute to energy saving and the SDGs. It models crystal growth processes and works on process informatics, which uses AI to search for the best growth conditions. The work has two pillars: developing and improving a group of simulators that clarify the chemical vapor deposition process, and exploring unexplored materials through process informatics.
View More ↗MembersFaculty
The members of the Process Design Engineering Lab consist of faculty, academic researchers, visiting researchers, technical staff, and doctoral and master's students.As of 2026
- ProfessorYoshihiro Kangawa
VoicesStudent voices
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Report an errorAbout the images
The top and research theme images are illustrative and were not taken at the lab. They are cropped from Wikimedia Commons images. Cropped CC BY-SA images are provided under the same CC BY-SA license as the original (version shown on each line).
- Top image: “Real snowflake macro photo” Alexey Kljatov / CC BY-SA 4.0 (cropped)
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- Related lab (材料構造制御学研究室): “Pyrope crystal structure” Kent G. Budge / CC BY-SA 4.0 (cropped)
- Related lab (熱・電子機能物性理工学研究室): “Peltierelement 16x16” No machine-readable author provided. Bye~commonswiki assumed (based on copyright claims). / Public domain (cropped)
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