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Quantum Beam Materials Science (Kozawa) Lab
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The lab investigates the chemical reactions that electron beams and extreme ultraviolet light cause in matter.
AboutAbout the lab
Exploring the chemical reactions that quantum beams trigger in matter
The Quantum Beam Materials Science Lab (Kozawa Lab) studies the chemical reactions, and the reaction fields, that quantum beams such as electron beams and extreme ultraviolet light induce in materials.
The use of quantum beams in the ionizing radiation range, as in extreme ultraviolet lithography for semiconductor manufacturing, is expected to expand significantly in the future.
The lab aims to clarify the mechanisms from the deposition of energy by quantum beams, through chemical reactions, to the emergence of function, and to build new chemical reaction systems that make it possible to manufacture next-generation high-performance semiconductors.
On the lab's website, it is presented under the name 'Kozawa Lab.'
Key terms
- Quantum beam
- In this lab, it refers to electron beams, extreme ultraviolet light, lasers, synchrotron radiation, X-rays, gamma rays, and ion beams.
- Extreme ultraviolet light
- Short-wavelength light in the ionizing radiation range. Also called EUV, it is used in lithography for semiconductor manufacturing.
- Lithography
- A fabrication technology for creating the ultrafine patterns of semiconductor circuits.
- Supercritical state
- A state that appears for water at or above 374°C and 22.1 MPa, in which density varies greatly with pressure.
ResearchResearch themes
The lab studies the chemical reactions and reaction fields that quantum beams, including electron beams, extreme ultraviolet light, lasers, synchrotron radiation, X-rays, gamma rays, and ion beams, induce in matter. It clarifies the chemical reaction systems from energy deposition, through chemical reactions, to the emergence of function, and uses the findings to build new chemical reaction systems.
*Illustrative imageSemiconductor Microfabrication and Quantum Beams
When extreme ultraviolet light (EUV), which lies in the ionizing radiation range, is used as the exposure source for lithography, the ultrafine semiconductor patterning technology, materials must be fundamentally redesigned. The lab holds that clarifying the phenomena light causes in spaces of a few nanometers and designing highly efficient reaction systems are essential for developing new materials.
*Illustrative imageExtreme Ultraviolet Chemistry in Condensed Phases
Radiation chemistry in the extreme ultraviolet region is unexplored territory, and offers extreme spatial and temporal resolution. This is an important energy range for clarifying the spatial distribution of cation-electron ion pairs produced by the interaction between quantum beams and molecules, and the chemical reactions that follow.
*Illustrative imageBeam-Induced Reactions under Extreme Conditions
The lab studies the interaction between radiation and materials in high-temperature, high-pressure, and supercritical states. Under extreme conditions where temperature, pressure, and density can be varied widely, it pursues the essence of radiation-induced chemical reactions that cannot be distinguished at room temperature, aiming at new fields such as controlling radiation effects in nuclear power generation.
*Illustrative imageRadiation Chemistry of Nanoparticles and Colloids
Nanoparticles and colloids are attracting attention in many fields as functional materials with novel catalytic activity and high durability. The lab is working to clarify the essence of the nanoparticle formation processes induced by quantum beams and of the interfacial reactions after formation, aiming to explore new reaction pathways and control those reactions.
MembersFaculty
Kozawa Lab members consist of faculty members, project researchers, research assistants, project administrative staff, and doctoral and master's students.As of 2026
- ProfessorTakahiro Kozawa
- Associate ProfessorYusa Muroya
- Assistant ProfessorKazumasa Okamoto
- Assistant ProfessorYuqing Jin
- Project ProfessorToshiro Itani
- Project Associate ProfessorJulius Joseph Sudlay Santillan
- Project Associate ProfessorEiichi Nomura
- Project Assistant ProfessorYuko Ito
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Report an errorAbout the images
The top and research theme images are illustrative and were not taken at the lab. They are cropped from Wikimedia Commons images. Cropped CC BY-SA images are provided under the same CC BY-SA license as the original (version shown on each line).
- Top image: “JEOL Electron Beam Lithography (EBL) ( )” Simon Fraser University - Communications & Marketing / CC BY 2.0 (cropped)
- Semiconductor Microfabrication and Quantum Beams: “Extreme ultraviolet lithography tool” Lawrence Livermore National Laboratory / Public domain (cropped)
- Extreme Ultraviolet Chemistry in Condensed Phases: “Continuous Electron Beam Accelerator Facility CEBAF Thomas Jefferson National Accelerator Facility Newport News Virgina ( )” doe-oakridge / Public domain (cropped)
- Beam-Induced Reactions under Extreme Conditions: “Reactor model at the Gösgen Nuclear Power Plant visitor centre, Däniken, Solothurn” Christian David / CC BY-SA 4.0 (cropped)
- Radiation Chemistry of Nanoparticles and Colloids: “Gold Colloid of varying size” Kumarbarc / CC BY-SA 4.0 (cropped)
- Related lab (Quantum Beam Physics (Hosokai) Lab): “The EMMA particle accelerator” Armduino / CC BY-SA 4.0 (cropped)
- Related lab (Yamada Lab): “Philips BT6000A-12 - Lithium Ion Battery ICR” Raimond Spekking / CC BY-SA 4.0 (cropped)
- Related lab (Sakamoto Lab): “Array of solar panels - geograph.org.uk - 8004553” Alan Hughes / CC BY-SA 2.0 (cropped)
- Related lab (Sekino Lab): “Functional ceramic” Giovanna Canu, CNR-ICMATE Giovanna 27 / CC BY 4.0 (cropped)
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